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The results of a detailed kinetic study of the main plasma chemical processes in non-equilibrium ethanol/argon plasma are presented. It is shown that at the beginning of the discharge the molecular hy...
The paper is devoted to the proof of the uniqueness theorem for solution of the equation for the non-local ionization source in a glow discharge and a hollow cathode in general 3D geometry. The theore...
In this paper we analyze the problem of glow discharge in low pressure plasma in industrial plant, for chambers of different shapes and various working parameters, like pressure and electric potential...
In this work, sputtering yield in a glow discharge ion source system has been determined using the operating parameters of the ion source. The sputtering yield is found to be varied between 0.4 to 1 a...
Emission spectra of constituent gas species from glow discharge plasmas using argon–helium, krypton–helium, argon–krypton, and krypton–argon gas mixtures were analyzed to elucidate collisional energy ...
A nitriding process based on two distinct nitrogen glow discharge modes, with sample temperatures ranging from 380 0C to 480 0C, was employed to treat the surface of austenitic stainless steel (SS 304...
Experiments in a low pressure glow discharge on gases of environmental relevance: CO2,CO y O2 are reported. We studied the various atomic processes: ionization, excitation and molecular dissociation w...
Hydrogenated amorphous silicon films were prepared in an rf glow-discharge system by decomposing undiluted silane at various rf power densities. Dark conductivity and photoconductivity of the films ha...
Hydrogenated amorphous silicon nitride films have been prepared by the glow-discharge decomposition of ammonia/silane gas mixture. From optical transmission measurements in the wavelength range from 4...
The electrical current in thin films obtained by the polymerization of acetonitrile in glow discharge on a heated substrate were investigated in order to determine the mechanism of electrical conducti...

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