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High Temperature Oxidized SnO2 Films Prepared by Reactive Sputtering
d.c. reactive ion an argon atmosphere oxygen partial pressures
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2010/12/21
Undoped and Sb-doped tin oxide films were prepared by d.c. reactive ion sputtering in an argon atmosphere with oxygen partial pressures ranging from 0 to 50%. The films were anneled in oxygen in the t...
Reproducibility of Properties of SnOx Thin Films Prepared by Reactive Sputtering
SnOx Thin Films Reactive Sputtering substrate temperature
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2010/12/23
The preparation of tin dioxide films by low energy reactive sputtering of tin and tin-antimony (1-10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the ran...